The computing power available to send the first man to the moon in 1969 was less than that available to each of us today on our smartphones. This incredible advance has been made possible by the miniaturization of microchips and the ever-evolving computing power of semiconductors.
The rise in wireless connectivity, sophisticated automotive features or the internet of things are reflected in the rise of demand for semiconductors capable of meeting the highest requirements. Ultra-pure specialty chemicals are the basic raw materials used in the photolithography process which forms the critical layer in the productions of memory and logic chips.
Heraeus Epurio, has been producing electronic grade photoactive materials for over 30 years. We have put together selected chromophores with vintage acids to create a unique product offering for critical layer resists in highest resolution.
Most of these products are available in UP quality boasting an above 99.5% purity and a metal content of all 26 metals below 10ppb each. This makes even conventional chemistry available for new frontiers in resist resolution.
35 Results
Name | Technology | Product Type | Description | |
---|---|---|---|---|
DTBPIO-C1 | Deep UV | PAG | Strong acid(C1) generation m.p. 104–105°C | |
DTBPIO-CS | Deep UV | PAG, PFAS-Free PAG | Weak acid (camphorsulfonic acid) generation m.p. 215–217°C | |
DTBPIO-Nf | Deep UV | PAG | Low diffusion strong acid(nonaflic acid) generation m.p. 175–177°C | |
DTBPIO-TFMBS | Deep UV | PAG | Weak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C | |
HTPG-104S | i-line | PAG, PFAS-Free PAG | White powder Strong acid (HCI) generation m.p. 143–145°C | |
ILP-110 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C | |
ILP-110N | i-line | PAG | Low diffusion strong acid (nonaflic acid) generation m.p. 122–124°C | |
ILP-113 | I, h-line broadband | PAG | Yellow powder Strong acid (triflic acid) generation m.p. 125–126°C | |
ILP-118 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C | |
MDT | Deep UV | PAG | White powder Strong acid (triflic acid) generation m.p. 88–89°C | |
NIN | i-line | PAG | White crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C | |
NIT | i-line | PAG | White powder Strong acid(triflic acid) generation m.p. 210–214°C | |
PA-229 | Deep UV | PAG | White powder Low diffusion strong acid (nonaflic acid) generation m.p. 54–56°C | |
PA-253 | ArF | PAG | Strong acid generation m.p. 128–129°C | |
PA-255 | ArF | PAG | Strong acid generation m.p. 93-95°C | |
PA-279 | ArF | PAG | Strong acid generation m.p. 143-145°C | |
PA-296 | Deep UV | PAG | Strong acid(N3) generation m.p. 159-161°C | |
PA-298 | i-line | PAG, PFAS-Free PAG | Yellow powder Weak acid(tosylic acid) generation m.p. 130–131°C | |
PA-304 | Deep UV | PAG | Strong acid(C1) generation m.p. 130–131°C | |
PA-313 | ArF | PAG | Strong acid generation m.p. 129–130°C |