Selecting the right electronic chemical is essential for ensuring optimal performance. By understanding your requirements, considering the application, prioritizing quality and reliability, you can confidently select the most suitable electronic chemical for your needs. With our Product Selector we help you to make an informed decision. Our experts are also available to povide valuable insights and guidance.
52 Results
Name | Technology | Product Type | Description | |
|---|---|---|---|---|
| 9-AMM | Multi-layer photo-lithographic application | Monomers | Yellow powder m.p. 86–88°C | |
| DTBPIO-C1 | Deep UV | PAG | Strong acid(C1) generation m.p. 104–105°C | |
| DTBPIO-CS | Deep UV | PAG, PFAS-Free PAG | Weak acid (camphorsulfonic acid) generation m.p. 215–217°C | |
| DTBPIO-Nf | Deep UV | PAG | Low diffusion strong acid(nonaflic acid) generation m.p. 175–177°C | |
| DTBPIO-TFMBS | Deep UV | PAG | Weak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C | |
| ECHA | Multi-layer photo-lithographic application | Monomers | Colourless liquid | |
| HAdMA | Multi-layer photo-lithographic application | Monomers | White powder m.p. 89–91°C | |
| HTPG-104S | i-line | PAG, PFAS-Free PAG | White powder Strong acid (HCI) generation m.p. 143–145°C | |
| HTPI-405 | i-line | PFAS-Free PAG, Photo-initiators | Weak acid generation m.p. 86-88°C | |
| HTPI-4057 | i-line | PFAS-Free PAG, Photo-initiators | Weak acid generation m.p. 56-58°C | |
| HTPI-429 | i-line | PFAS-Free PAG, Photo-initiators | Weak acid generation m.p. 71-74°C | |
| ILP-110 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C | |
| ILP-110N | i-line | PAG | Low diffusion strong acid (nonaflic acid) generation m.p. 122–124°C | |
| ILP-113 | I, h-line broadband | PAG | Yellow powder Strong acid (triflic acid) generation m.p. 125–126°C | |
| ILP-118 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C | |
| MAdMA | Multi-layer photo-lithographic application | Monomers | Colourless liquid | |
| MDT | Deep UV | PAG | White powder Strong acid (triflic acid) generation m.p. 88–89°C | |
| MNLMA | Multi-layer photo-lithographic application | Monomers | White powder m.p. 74~77°C | |
| NIN | i-line | PAG | White crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C | |
| NIT | i-line | PAG | White powder Strong acid(triflic acid) generation m.p. 210–214°C |